Krishnakumar, E. ; Srivastava, S. K. (1991) Dissociative attachment of electrons with Si2H6 International Journal of Mass Spectrometry and Ion Processes, 103 (2-3). pp. 107-115. ISSN 0168-1176
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0168-1176(91)80082-X
Abstract
Cross-sections for the production of negative ion fragments by electron attachment to Si2H6 and ion pair formation from it have been measured by utilizing the crossed electron beam-molecular beam collision technique. The negative ions are mass analyzed by employing a quadrupole mass spectrometer. There are serious disagreements between the present and two previously published results. In the present paper cross-section values, appearance potentials, and the various channels of dissociation for the formation of negative monosilane fragments are presented.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 95386 |
| Deposited On: | 06 Nov 2012 11:42 |
| Last Modified: | 06 Nov 2012 11:42 |
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