Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on a Si(100) substrate

Abstract

We report a detailed study of surface and interface properties of pulsed-laser-deposited NiMnSb films on a Si(100) substrate as a function of film thickness. As the thickness of films is reduced below 35 nm, formation of a porous layer is observed. Porosity in this layer increases with decrease in NiMnSb film thickness. These morphological changes of the ultrathin films are reflected in the interesting transport and magnetic properties of these films. Compositional anomaly and surface and interface roughness are not the source of magnetic and transport properties of the films.