Hapase, M. G. ; Gharpurey, M. K. ; Biswas, A. B. (1968) Oxidation of vacuum deposited films of lead Surface Science, 12 (1). pp. 85-91. ISSN 0039-6028
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0039-6028(68)90010-1
Abstract
The oxidation of lead films in oxygen atmosphere (30 Torr) in the temperature range 227-307°C has been carried out employing the microgravimetric technique. The oxidation behaviour is parabolic and the rate constant is given by the equation Kp = 5.84 ×10-4 exp(-24000/RT)(g2/cm4sec)From a comparison of the derived diffusion coefficient data with those reported in the literature it has been concluded that the rate is controlled by the diffusion of anions through migration of vacancies.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 81144 |
| Deposited On: | 04 Feb 2012 07:40 |
| Last Modified: | 04 Feb 2012 07:40 |
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