Performance considerations in using high-k dielectrics for deep sub-micron MOSFETs

Inani, A. ; Ramgopal Rao, V. ; Cheng, B. ; Cao, M. ; Voorde, P. V. ; Greene, W. ; Woo, J. C. S. (1998) Performance considerations in using high-k dielectrics for deep sub-micron MOSFETs Proceedings of the Solid state Devices and Materials (SSDM) Research Conference, Hiroshima, Japan . pp. 94-95.

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Item Type:Article
Source:Copyright of this article belongs to Proceedings of the Solid state Devices and Materials (SSDM) Research Conference, Hiroshima, Japan.
ID Code:79806
Deposited On:28 Jan 2012 11:43
Last Modified:28 Jan 2012 11:43

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