A study of the effect of plasma etch damage on sub-micron MOSFET's flicker noise properties

Sachdev, R. ; Wijeratne, G. ; Ramgopal Rao, V. ; Viswanathan, C. R. (1998) A study of the effect of plasma etch damage on sub-micron MOSFET's flicker noise properties Technical Digest, 28th European Solid-State Device Research Conference (ESSDERC), Bordeaux, France . pp. 572-575.

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Item Type:Article
Source:Copyright of this article belongs to Technical Digest, 28th European Solid-State Device Research Conference (ESSDERC), Bordeaux, France.
ID Code:79805
Deposited On:28 Jan 2012 11:43
Last Modified:28 Jan 2012 11:43

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