Patil, Samadhan B. ; Vaidya, Sangeeta ; Kumbhar, Alka ; Dusane, R. O. ; Chandorkar, A. N. ; Ramgopal Rao, V. (2000) Low temperature Hot-Wire CVD nitrides for deep sub-micron CMOS technologies SPIE Proceedings Series, 3975 (2). pp. 879-882. ISSN 1017-2653
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Abstract
In this work we report results on MNS capacitors with the silicon nitride films fabricated by using a novel Hot-Wire CVD technique. The dependence of deposition parameters on the film properties is looked into. Our electrical characterisation results on MNS capacitors show good oxide breakdown fields, and low leakage.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to The International Society for Optical Engineering. |
| ID Code: | 79796 |
| Deposited On: | 28 Jan 2012 11:44 |
| Last Modified: | 28 Jan 2012 11:44 |
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