Randlett, M. R. ; Stroberg, E. H. ; Chopra, K. L. (1966) Mechanical system for multiple thin film deposition Review of Scientific Instruments, 37 (10). pp. 1378-1380. ISSN 0034-6748
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Official URL: http://rsi.aip.org/resource/1/rsinak/v37/i10/p1378...
Related URL: http://dx.doi.org/10.1063/1.1719986
Abstract
A simple and versatile mechanical system, capable of allowing monitored deposition of sequential thin films on any one of the five substrates from any one of the five independent sources, and through any one of the five masks, is described. The vapor sources are moved by rotation. The substrates, masks, and the shutter are moved by sliding racks. All these movements are affected by one push-pull, rotary, and 60° cone feedthrough. Every component is easily removable for cleaning. The evaporation sources are shielded by removable chimneys. The electrical connection for resistive heating of the source is made by a uniquely designed roller bearing contact.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to American Institute of Physics. |
| ID Code: | 76400 |
| Deposited On: | 31 Dec 2011 14:40 |
| Last Modified: | 31 Dec 2011 14:40 |
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