Laser-induced forward transfer technique for maskless patterning of amorphous V2O5 thin film

Chakraborty, S. ; Sakata, H. ; Yokoyama, E. ; Wakaki, M. ; Chakravorty, D. (2007) Laser-induced forward transfer technique for maskless patterning of amorphous V2O5 thin film Applied Surface Science, 254 (2). pp. 638-643. ISSN 0169-4332

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S01694...

Related URL: http://dx.doi.org/10.1016/j.apsusc.2007.06.066

Abstract

A laser-induced forward transfer technique has been applied for the maskless patterning of amorphous V2O5 thin films. A sheet beam of a frequency doubled (SHG) Q-switched Nd:YAG laser was irradiated on a transparent glass substrate (donor), the rear surface of which was pre-coated with a vacuum-deposited V2O5 180 nm thick film was either in direct contact with a second glass substrate (receiver) or a 0.14 mm air-gap was maintained between the donor film and the receiving substrate. Clear, regular stripe pattern of the laser-induced transferred film was obtained on the receiver. The pattern was characterized using X-ray diffraction (XRD), optical absorption spectroscopy, scanning electron microscopy (SEM), energy dispersive analysis of X-ray (EDAX), atomic force microscopy (AFM), etc.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:Laser-induced forward Transfer; Nd:yag Laser; Maskless Patterning; V2o5 Thin Film
ID Code:7433
Deposited On:25 Oct 2010 11:33
Last Modified:28 May 2011 04:30

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