Atomic force microscopy study of thermal stability of silver selenide thin films grown on silicon

Mohanty, Bhaskar Chandra ; Murty, B. S. ; Vijayan, V. ; Kasiviswanathan, S. (2006) Atomic force microscopy study of thermal stability of silver selenide thin films grown on silicon Applied Surface Science, 252 (22). pp. 7975-7982. ISSN 0169-4332

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Official URL: http://www.sciencedirect.com/science/article/pii/S...

Related URL: http://dx.doi.org/10.1016/j.apsusc.2005.10.004

Abstract

Silver selenide thin films were grown on silicon substrates by the solid-state reaction of sequentially deposited Se and Ag films of suitable thickness. Transmission electron microscopy and particle-induced X-ray emission studies of the as-deposited films showed the formation of single phase polycrystalline silver selenide from the reaction of Ag and Se films. Atomic force microscopy images of the as-deposited and films annealed at different temperatures in argon showed the film morphology to evolve into an agglomerated state with annealing temperature. The results indicate that when annealed above 473 K, silver selenide films on silicon become unstable and agglomerate through holes generated at grain boundaries.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:Ag2Se; AFM; Agglomeration
ID Code:73812
Deposited On:07 Dec 2011 04:59
Last Modified:07 Dec 2011 04:59

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