Microstructure dependent physical properties of evaporated tin sulfide films

Devika, M. ; Ramakrishna Reddy, K. T. ; Koteeswara Reddy, N. ; Ramesh, K. ; Ganesan, R. ; Gopal, E. S. R. ; Gunasekhar, K. R. (2006) Microstructure dependent physical properties of evaporated tin sulfide films Journal of Applied Physics, 100 (2). 023518 _1-023518 _7. ISSN 0021-8979

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Official URL: http://jap.aip.org/resource/1/japiau/v100/i2/p0235...

Related URL: http://dx.doi.org/10.1063/1.2216790

Abstract

In the field of photovoltaics, semiconductors of the III-V group such as GaAs and InP have been considered as the most efficient absorber materials due to their direct energy band gap and high mobility. In these compounds, arsenic and phosphorus are highly toxic and expensive. In this work we present systematic preparation of low cost SnS thin films and characterize these films to test their suitability for photovoltaic applications. We have observed that the films (with thickness ≅ 0.5 μ m) grown at the substrate temperature of 275°C exhibit a low resistive single SnS phase and have a direct optical band gap of 1.35 eV with an absorption coefficient of ~ 105 cm-1. SnS films could be alternative semiconductor materials as absorbers for the fabrication of photovoltaic devices.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
Keywords:Tin Compounds; IV-VI Semiconductors; Semiconductor Thin Films; Crystal Microstructure; Semiconductor Growth; Photovoltaic Effects; Absorption Coefficients; Energy Gap
ID Code:71088
Deposited On:24 Nov 2011 04:04
Last Modified:24 Nov 2011 04:04

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