Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high Tc YBCO films

Mishra, S. K. ; Sarkar, A. ; Ray, S. K. ; Bhattacharya, D. ; Chopra, K. L. ; Das, S. R. (1993) Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high Tc YBCO films Journal of Vacuum Science and Technology A, 11 (5). pp. 2747-2751. ISSN 0734-2101

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Official URL: http://avspublications.org/jvsta/resource/1/jvtad6...

Related URL: http://dx.doi.org/10.1116/1.578636

Abstract

Determination of the key internal discharge parameters such as charge particle concentration, plasma potential, and electron temperature has been made for sputter deposition of superconducting YBCO films in Ar and Ar+O2 plasma using a tuned Langmuir probe technique. The plasma parameters measured from probe characteristics have been used to qualitatively explain the effect of deposition conditions on film property. The behavior of dc self-bias at the target is discussed in the light of the combined effect of O̅2 ion emission and Ba+ ion interaction with the target.

Item Type:Article
Source:Copyright of this article belongs to AVS (American Vacuum Society).
Keywords:Superconducting Films; High−Tc Superconductors; Yttrium Oxides; Barium Oxides; Copper Oxides; Langmuir Probe;Plasma Diagnostics; Oxygen; Argon;Sputtering; Plasma Potential; Electron Temperature; Electric Discharges;Magnetrons; Quaternary Compounds
ID Code:69141
Deposited On:22 Dec 2011 14:08
Last Modified:22 Dec 2011 14:08

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