Suresh, S. ; Joshi, U. M. ; Vinod, M. P. ; Pavaskar, N. R. ; Vijayamohanan, K. (1997) Formation of silicon nanoclusters during the reaction of β-ionone with tetrachlorosilane Chemistry of Materials, 9 (5). pp. 1186-1190. ISSN 0897-4756
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Official URL: http://pubs.acs.org/doi/abs/10.1021/cm9605680
Related URL: http://dx.doi.org/10.1021/cm9605680
Abstract
The chemical reaction between β-ionone and tetrachlorosilane yields silicon nanoclusters entrapped in a polysiloxane matrix along with a cyclized product of β-ionone as a side product. The IR spectrum observed in the entire region of 1000-1200 cm-1 indicates the polymer chain length, while UV absorption at 320 nm shows the presence of extended π-conjugation in the system. Photoluminescence spectrum shows a broad band with a maximum at 724 nm and is qualitatively similar to that of porous silicon and related q-particles. Transmission electron microscopy and selected area electron diffraction analysis show the presence of embedded nanocrystalline Si particles of average particle size 50-60 nm. ESR spectrum shows a sharp signal with a g value of 2.0138 due to the dangling bonds of silicon clusters, while cyclic voltammetry gives a reversible peak with E½at +1.92 V and an irreversible peak at -0.48 V vs saturated calomel electrode (SCE) confirming the mechanism of reductive silylation of the conjugated ketones.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Chemical Society. |
ID Code: | 68866 |
Deposited On: | 07 Nov 2011 05:03 |
Last Modified: | 07 Nov 2011 05:03 |
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