Impedance of metal-gel derived film interface

Banerjee, S. ; Chakravorty, D. (1997) Impedance of metal-gel derived film interface Japanese Journal of Applied Physics, 36 . pp. 7329-7333. ISSN 0021-4922

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Official URL: http://jjap.jsap.jp/link?JJAP/36/7329/

Related URL: http://dx.doi.org/10.1143/JJAP.36.7329

Abstract

Gel films of different compositions were grown on stainless steel and copper electrodes with varying degrees of roughness. The gel systems chosen were xM2O-(100- x)SiO2 (mole%) with M=Li, Na or K and x having values 10, 20 and 30 respectively. AC impedance of cells comprising the above with a counter electrode of the same type was measured over the frequency range 5 Hz to 1000 kHz. Constant Phase Angle (CPA) impedance characterizing the electrode-electrolyte interface shows a variation with frequency with the exponent n having values in the range 0.30 to 0.48. The fractal dimensions d of the electrode surfaces were determined from the self affine surface profile measurements. The ac impedance deduced n values are found to be in reasonable agreement with those calculated from the fractal dimensions of the electrode surfaces.

Item Type:Article
Source:Copyright of this article belongs to Institute of Pure and Applied Physics.
ID Code:65012
Deposited On:15 Oct 2011 12:13
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