Pinto, R. ; Gupta, L. C. ; Vijayaraghavan, R. ; Chourey, A. G. ; Shirodkar, V. S. (1990) Cylindrical magnetron sputtering parameters for the growth of Y1Ba2Cu3O7−x thin films Physica C: Superconductivity, 171 (1-2). pp. 131-134. ISSN 0921-4534
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0921-4534(90)90465-Q
Abstract
We have studied cylindrical hollow cathode magnetron sputtering configuration with the aim of eliminating negative ion back-sputtering and realizing stoichiometric YBaCuO thin films from stoichiometric YBaCuO hollow cylindrical target. Results obtained indicate that under optimized sputtering conditions, YBaCuO films with excellent compositional uniformity within 1% of that of the target can be realized over an area almost 90% of the area covered by the inner diameter of the cylindrical target. Films deposited on unheated < 100 > MgO substrates and post annealed at 920°C in oxygen have shown a superconducting onset at 84 K and a zero resistance transition at 80 K.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 61912 |
| Deposited On: | 15 Sep 2011 11:51 |
| Last Modified: | 15 Sep 2011 11:51 |
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