Low temperature growth of polycrystalline indium phosphide

Roy, J. N. ; Basu, S. ; Bose, D. N. (1981) Low temperature growth of polycrystalline indium phosphide Solar Energy Materials, 5 (4). pp. 379-382. ISSN 0165-1633

Full text not available from this repository.

Official URL: http://linkinghub.elsevier.com/retrieve/pii/016516...

Related URL: http://dx.doi.org/10.1016/0165-1633(81)90072-1

Abstract

A new method for the growth of polycrystalline InP at low temperature (500° C) is reported using iodide formation as an intermediate step. X-ray diffraction studies showed clearly the formation of InP, with grain size 10-20 µm as determined by SEM. The material has also been characterised using resistivity. Hall effect and photovoltage measurements which showed a carrier concentration of 2 × 1016cm-3, electron mobility of 27.9 cm2/V s and a band gap of 1.28 eV at 300 K.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:5778
Deposited On:19 Oct 2010 10:59
Last Modified:23 May 2011 04:29

Repository Staff Only: item control page