Prathima, N. ; Harini, M. ; Rai, Neeraj ; Chandrashekara, R. H. ; Ayappa, K. G. ; Sampath, S. ; Biswas, S. K. (2005) Thermal study of accumulation of conformational disorders in the self-assembled monolayers of C8 and C18 alkanethiols on the Au(111) surface Langmuir, 21 (6). pp. 2364-2374. ISSN 0743-7463
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Official URL: http://pubs.acs.org/doi/abs/10.1021/la048654z
Related URL: http://dx.doi.org/10.1021/la048654z
Abstract
The thermal stability of short alkanethiol CH3(CH2)7SH (C8) and long C18 self-assembled monolayers (SAMs) is investigated using grazing angle reflection-absorption infrared spectroscopy, cyclic voltammetry, and molecular dynamics simulation. We track the disordering of SAM by untilting and gauche defect accumulation with increasing temperature in the 300-440 K range, a range of interest to tribology. Molecular dynamics simulation with both fully covered and partially covered C6, C8, and C18 monolayers brings out the morphological changes in the SAM, which may be associated with the observed thermal stability characteristics. The molecular dynamics simulations reveal that short-chain C6 and C8 alkanethiols are more defective at lower temperature than the long-chain C18 alkanethiol. With increasing temperature disorder in the SAM, as reflected in both untilting and gauche defect accumulation, tends to saturate at temperatures below 360 K for short-chain SAMs such that any further increase in temperature, until desorption, does not lead to any significant change in conformational order. In contrast the disorder in the long-chain C18 SAM increases monotonically with temperature beyond 360 K. Thus, in a practical range of temperature, the ability of a SAM to retain order with increasing thermal perturbations is governed by the state of disorder prior to heat treatment. This deduction derived from molecular dynamics simulation helps to rationalize the significant difference we have observed experimentally between the thermal response of short- and long-chain thiol molecules.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Chemical Society. |
ID Code: | 57318 |
Deposited On: | 26 Aug 2011 08:03 |
Last Modified: | 26 Aug 2011 08:03 |
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