Chaki, Nirmalya Kumar ; Singh, Poonam ; Dharmadhikari, C. V. ; Vijayamohanan, Kunjukrishna P. (2004) Single-electron charging features of larger, dodecanethiol-protected gold nanoclusters: electrochemical and scanning tunneling microscopy studies Langmuir, 20 (23). pp. 10208-10217. ISSN 0743-7463
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Official URL: http://pubs.acs.org/doi/abs/10.1021/la048489n
Related URL: http://dx.doi.org/10.1021/la048489n
Abstract
In this report, we demonstrate the single-electron charging features of larger-sized (ca. 3.72 nm) Au nanoclusters protected with dodecanethiol [approximate composition, Au1415(RS)328] using combined electrochemical and scanning tunneling microscopic (STM) studies. In particular, these nanoclusters show a highly populated single-electron charging peak in voltammetric experiments, where the calculated capacitance is in good agreement with the experimentally obtained value of 1.6 aF. In comparison to the voltammetric studies, STM measurements over a single Au particle on the highly oriented pyrolytic graphite surface reveal nonlinear current-voltage (I-V) characteristics with a large central gap, signifying single-electron-transfer features. The I-V results demonstrate a clear Coulomb blockade effect with a central gap of around 0.2 eV, which is in good agreement with the orthodox theory for the double barrier tunnel junction system. The standard heterogeneous electron-transfer rate constant estimated from impedance measurements is found to be of 7.97 × 10−6 cm·s−1, suggesting that the process is very sluggish. Furthermore, diffusion coefficient (Dc) values calculated from chronoamperometry and impedance measurements are in good agreement with theoretically calculated values using the modified Stokes-Einstein equation. The electron-transfer rate constant estimated from cyclic voltammograms of adsorbed monolayer protected Au nanoclusters is found to be about 2 s−1, which is slower than that reported for its smaller analogues.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Chemical Society. |
ID Code: | 53279 |
Deposited On: | 05 Aug 2011 11:17 |
Last Modified: | 05 Aug 2011 11:17 |
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