Kumari, Latha ; Subramanyam, S. V. (2006) Magnetoresistance and magnetic field induced metal-insulator transition in intercalated amorphous carbon Materials Science and Engineering: B, 129 (1-3). pp. 48-53. ISSN 0921-5107
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Official URL: http://www.sciencedirect.com/science/article/pii/S...
Related URL: http://dx.doi.org/10.1016/j.mseb.2005.12.029
Abstract
In this work, we discuss the preparation of iodine and sulfur incorporated amorphous carbon (a-C) films by vapor phase pyrolysis technique. Iodine incorporated a-C films depict an unusual resistivity behavior at low temperatures, where a clear positive temperature coefficient (PTCR) is witnessed, which also depicts a pyrolysis temperature and iodine incorporation induced metal-insulator (M-I) transition. Magnetic field induced M-I transition is also observed in iodinated samples. Magnetoresistance measurements performed on these films from 1.3-10 K in the presence of magnetic field (0-7 T) account for a positive magnetoresistance irrespective of the regimes they fall in. Universal scaling of magnetoconductance observed in intercalated a-C system depicts the dominance of electron-electron interaction.
Item Type: | Article |
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Source: | Copyright of this article belongs to Elsevier Science. |
Keywords: | Amorphous Carbon; Electrical Properties; Metal-insulator Transition; Magnetoresistance |
ID Code: | 51534 |
Deposited On: | 28 Jul 2011 14:41 |
Last Modified: | 28 Jul 2011 14:41 |
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