Dey, Shirshendu ; Pethkar, Sushama ; Adyanthaya, Suguna D. ; Sastry, Murali ; Dharmadhikari, C. V. (2008) New approach towards imaging λ-DNA using scanning tunneling microscopy/spectroscopy (STM/STS) Bulletin of Materials Science, 31 (3). pp. 309-312. ISSN 0250-4707
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Official URL: http://www.ias.ac.in/matersci/bmsjun2008/309.pdf
Related URL: http://dx.doi.org/10.1007/s12034-008-0049-6
Abstract
A new methodology to anchor λ-DNA to silanized n-Si(111) surface using Langmuir Blodget trough was developed. The n-Si (111) was silanized by treating it with low molecular weight octyltrichlorosilane in toluene. Scanning tunneling microscopy (STM) image of λ-DNA on octyltrichlorosilane deposited Si substrate shows areas exhibiting arrayed structures of 700 nm length and 40 nm spacing. Scanning tunneling spectroscopy (STS) at different stages depict a broad distribution of defect states in the bandgap region of n-Si(111) which presumably facilitates tunneling through otherwise insulating DNA layer.
Item Type: | Article |
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Source: | Copyright of this article belongs to Indian Academy of Sciences. |
Keywords: | DNA; Scanning Tunneling Microscopy; Langmuir Blodget Technique; Silanization |
ID Code: | 47189 |
Deposited On: | 06 Jul 2011 14:24 |
Last Modified: | 18 May 2016 02:56 |
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