Fabrication of cerium-doped LaNiO3 thin films on LaAlO3 (100) substrate by pulsed laser deposition

Chaitanya Lekshmi, I. ; Gayen, Arup ; Sarma, D. D. ; Hegde, M. S. ; Chockalingam, S. P. ; Chandrasekhar, N. (2005) Fabrication of cerium-doped LaNiO3 thin films on LaAlO3 (100) substrate by pulsed laser deposition Journal of Applied Physics, 98 (9). 093527_1-093527_7. ISSN 0021-8979

Full text not available from this repository.

Official URL: http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arn...

Related URL: http://dx.doi.org/10.1063/1.2128046

Abstract

In this study we report the fabrication of La1−xCexNiO3 (0≤x≤0.4) thin films on a LaAlO3 (100) substrate by pulsed laser deposition where the cerium ions are believed to be in the Ce (IV) oxidation state. At low Ce concentrations, the films grow in the (100) direction with a pseudocubic structure and above x~0.3, they exhibit a change in the crystal symmetry. Core-level photoelectron spectroscopic studies of the thin films deposited have shown that the cerium exists in the +4 oxidation state. Correspondingly, the nickel exhibits mixed valency in these thin films. Conductivity of this highly metallic system progressively decreases as more and more Ce is doped. In the range 0.3 < x < 0.4, the system undergoes a transition from metallic to semiconducting behavior. The electrical nature of La1−xCexNiO3 thin films gives clear indications of significant electron-lattice interactions present for compositions close to the transition.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
ID Code:46451
Deposited On:04 Jul 2011 12:07
Last Modified:11 Jul 2012 04:18

Repository Staff Only: item control page