Sharma, Asha ; Lourderaj, U. ; Deepak, ; Sathyamurthy, N. (2005) Determination of stability and degradation in polysilanes by an electronic mechanism Journal of Physical Chemistry B, 109 (33). pp. 15860-15867. ISSN 1520-6106
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Official URL: http://pubs.acs.org/doi/abs/10.1021/jp0508756
Related URL: http://dx.doi.org/10.1021/jp0508756
Abstract
Polysilanes are potential candidates for active materials in light emitting diodes because of possible emission in the near-ultraviolet to blue region. Unfortunately, they degrade rapidly upon exposure to light because of scission of sigma bonds. Relative stability of four polysilanes, for example, poly(di-n-butylsilane) (PDBS), poly(di-n-hexylsilane) (PDHS), poly(methylphenylsilane) (PMPS), and poly[bis(p-butylphenyl)silane] (PBPS), which have been reported as active materials in light emitting diodes, have been investigated theoretically through semiempirical (AM1) and ab initio (HF/6-31g∗) methods and density functional theory using B3LYP parametrization. The AM1 level of calculation predicts the absorption maxima reasonably, but it fails to explain the relative stabilities of the four polysilanes in the excited state. However, calculations based on configuration interaction with single excitation and time-dependent density functional theory suggest additional stabilization in the excited states through intersystem crossing to triplets for PMPS and PBPS, consistent with the experimental observation. In contrast, no such stabilization is predicted for PDBS and PDHS. Furthermore, the existence of a stable triplet state in PMPS may also explain the visible emission observed experimentally in PMPS.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Chemical Society. |
ID Code: | 43897 |
Deposited On: | 17 Jun 2011 12:42 |
Last Modified: | 17 Jun 2011 12:42 |
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