Sarala Devi, G. ; Roy, Sujit ; Rao, V. J. (1993) Boron nitride thin films on Si(100) by metal organic chemical vapour deposition Solid State Communications, 87 (1). pp. 67-70. ISSN 0038-1098
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0038-1098(93)90538-X
Abstract
Crystalline boron nitride thin films have been deposited on silicon substrates by MO-CVD at different temperatures using a single source III-V precursor in N2 ambient. The deposited films are characterized by XRD and IR techniques. XRD confirms that the films are mostly polycrystalline with (111), (200), (004), (103) oriented cubic and hexagonal phases of boron nitride. IR also shows a mixture of cubic and nexagonal boron nitride phases.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 42947 |
| Deposited On: | 08 Jun 2011 08:20 |
| Last Modified: | 08 Jun 2011 08:20 |
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