Ratna Phani, A. ; Roy, Sujit ; Rao, V. J. (1995) Growth of boron nitride thin films by metal-organic chemical vapour deposition Thin Solid Films, 258 (1-2). pp. 21-25. ISSN 0040-6090
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0040-6090(94)06335-4
Abstract
Boron nitride films were grown for the first time by metal-organic chemical vapour deposition from trimethyl borazine as a single-source organometallic precursor containing boron and nitrogen. Films were deposited at various substrate temperatures using ammonia as a carrier gas and were characterized by IR spectroscopy, X-ray diffraction and scanning electron microscopy; these reveal the presence of crystallites of boron nitride with an sp2- and sp3-bonded structure.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| Keywords: | Boron Nitride; Chemical Vapour Deposition; Infrared Spectroscopy; Scanning Electron Microscopy |
| ID Code: | 42940 |
| Deposited On: | 08 Jun 2011 08:06 |
| Last Modified: | 08 Jun 2011 08:06 |
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