Sharma, Neha ; Kumar, N. ; Sundaravel, B. ; Panda, Kalpataru ; David, Wang ; Kamarrudin, M. ; Dash, S. ; Panigrahi, B. K. ; Tyagi, A. K. ; Lin, I-Nan ; Baldev Raj, (2011) Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique Tribology International . ISSN 0301-679X
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S03016...
Related URL: http://dx.doi.org/10.1016/j.triboint.2011.03.028
Abstract
Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the ID/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ- bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| Keywords: | Nano-Crystalline Diamond; Dangling Bonds; Coefficient of Friction |
| ID Code: | 40333 |
| Deposited On: | 23 May 2011 12:58 |
| Last Modified: | 23 May 2011 12:58 |
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