Patel, Ambalal Ranchhodhbhai ; Rao, K. V. (1980) The influence of the substrate and the substrate temperature on the crystallinity of tin films Thin Solid Films, 70 (2). pp. 253-260. ISSN 0040-6090
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...
Related URL: http://dx.doi.org/10.1016/0040-6090(80)90366-1
Abstract
Thin films of tin were prepared on various substrates (NaCl, KCl, KBr and KI) and at various substrate temperatures (28–90°C) and were studied using transmission electron microscopy and selected area electron diffraction techniques. To determine the dependence on cleanness, tin was deposited on single-crystal surfaces prepared by vacuum cleaving. Films were prepared on substrate surfaces to which a parallel d.c. electric field (0-1000 Vcm-1) was applied. It was observed that the crystallites of tin films deposited on KBr were more preferentially oriented than those deposited on NaCl, KCl or KI. The effects of vacuum cleaving and of d.c. electric fields are discussed.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 32844 |
| Deposited On: | 03 May 2011 13:54 |
| Last Modified: | 03 May 2011 13:54 |
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