Nayak, S. K. ; Srinivasan, T. G. ; Vasudeva Rao, P. R. ; Mathews, C. K. (1988) Photochemical destruction of organic compounds formed during dissolution of uranium carbide in nitric acid Separation Science and Technology, 23 (12-13). pp. 1551-1561. ISSN 0149-6395
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Related URL: http://dx.doi.org/10.1080/01496398808075648
Abstract
The dissolution of carbide fuels in nitric acid leads to the formation of a number of organic compounds which cause serious interference in the subsequent steps of reprocessing. In the present work, the optimum conditions for the photochemical destruction of these compounds by excited uranyl ion were established. The optimum concentration of uranium was found to be in the range 10-45 mg/mL. The destruction rate was found to decrease with increase in acidity. It was established that apart from oxalic and mellitic acids, some other unidentified compounds were also responsible for the interference in solvent extraction.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Taylor and Francis Ltd. |
| ID Code: | 25456 |
| Deposited On: | 06 Dec 2010 13:22 |
| Last Modified: | 06 Jun 2011 11:44 |
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