Lithographic patterning of superconducting YBCO films

Abstract

Microbridges of YBa₂Cu₃O₇ thin films have been fabricated by conventional photolithography and wet chemical etching using EDTA, and by the lift-off lithography technique. The variation of etch rate with etch time, etchant temperature, and post-deposition sintering temperature has been studied. It has been shown that both techniques are useful for film patterning. However, an additional sintering step is necessary for the chemically etched sample to regain the original film properties. An order of increase in critical current density is observed for the patterned film.