Agarwal, V. ; Vankar, V. D. ; Chopra, K. L. (1989) Reactive-magnetron-sputtered chromium carbide films Thin Solid Films, 169 (2). pp. 281-288. ISSN 0040-6090
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...
Related URL: http://dx.doi.org/10.1016/0040-6090(89)90711-6
Abstract
Chromium carbide films were deposited by r.f. reactive magnetron sputtering of chromium in an acetylene plasma. The carbon-to-chromium ratio in the films was found to increase with substrate temperature and acetylene partial pressure, resulting in a supersaturated solid solution of carbon in a chromium matrix and the Cr23C6 phase. The microstructure and composition of the films were found to be very sensitive to the deposition temperature and incorporated hydrogen and hydrocarbon radicals.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 23138 |
| Deposited On: | 25 Nov 2010 13:28 |
| Last Modified: | 28 May 2011 04:50 |
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