Rastogi, R. S. ; Vankar, V. D. ; Chopra, K. L. (1991) Silicide formation by solid state reaction of Mo-Ni and Mo-Co films with Si(100) Thin Solid Films, 199 (1). pp. 107-112. ISSN 0040-6090
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...
Related URL: http://dx.doi.org/10.1016/0040-6090(91)90056-4
Abstract
The solid state reaction between co-sputtered amorphous and polycrystalline Mo-Ni and Mo-Co films with Si(100) has been studied by glancing angle X-ray diffraction and Auger electron spectroscopy. The amorphous and the polycrystalline films exhibit different reaction kinetics and lead to the formation of several intermediate phases which depend on annealing temperature and the composition. The ultimate result is a macroscopic phase separation and formation of a bilayer structure. The possible reaction mechanisms are discussed.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 23058 |
| Deposited On: | 25 Nov 2010 13:37 |
| Last Modified: | 28 May 2011 04:43 |
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