Barthwal, S. K. ; Nath, Prem ; Chopra, K. L. (1975) Effect of impurities on the thermoelectric power of amorphous germanium Solid State Communications, 16 (6). pp. 723-727. ISSN 0038-1098
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/003810...
Related URL: http://dx.doi.org/10.1016/0038-1098(75)90061-7
Abstract
Large and anomalous changes in the thermoelectric power of amorphous (a-) Ge films have been observed on doping with impurities of Al, Fe and Sb. Depending on the concentration, Al and Sb impurities contribute a negative thermoelectric power below 300°K. and a positive thermoelectric power above 300°K. The effect of Fe is very small below 1 at. %. The thermoelectric power attains high temperature-independent positive values for large (> 1 at. %) concentrations of Al. The observed effects of the impurities cannot be understood in terms of the conventional crystalline semiconductor concepts. A band structure model for a-Ge has been proposed to qualitatively understand the changes in the sign and magnitude of the thermoelectric power with temperature.
Item Type: | Article |
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Source: | Copyright of this article belongs to Elsevier Science. |
ID Code: | 22975 |
Deposited On: | 25 Nov 2010 13:45 |
Last Modified: | 28 May 2011 09:55 |
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