Krupanidhi, S. B. ; Sayer, M. (1984) Radio frequency magnetron sputtering of multicomponent ferroelectric oxides Journal of Vacuum Science & Technology A Vacuum, Surfaces, and Films, 2 (2). pp. 303-306. ISSN 0734-2101
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Official URL: http://link.aip.org/link/?JVTAD6/2/303/1
Related URL: http://dx.doi.org/10.1116/1.572588
Abstract
Lead zirconate titanate, a multicomponent ferroelectric oxide has been sputtered using a planar rf magnetron technique. The characteristics of the discharge were monitored through the cathode self-bias voltage and were correlated with rf power, sputtering gas partial and total pressures, and the rate of film deposition. The physical properties of the films were affected by deposition rate, substrate temperature, and sputtering pressure. Good transparent ferroelectric PZT films exhibited a dielectric constant of 950 and conductivity as low as 10-10 Ω-1cm-1. These films were sputtered in 100% oxygen at 40 mTorr at an optimum deposition rate of 0.6-0.7 µ /h.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to American Vacuum Society. |
| ID Code: | 19080 |
| Deposited On: | 25 Nov 2010 14:24 |
| Last Modified: | 06 Jun 2011 11:40 |
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