Vedpathak, Mahesh ; Basu, Saibal ; Kulkarni, S. K. (1997) Characterization of nickel-copper multilayer and copper thin film using neutron reflectivity measurements Applied Surface Science, 115 (4). pp. 311-316. ISSN 0169-4332
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S01694...
Related URL: http://dx.doi.org/10.1016/S0169-4332(97)00162-1
Abstract
The use of neutron reflectivity measurement for characterizing thin films has become an important non-destructive tool. We have done a systematic characterization study of 'Corning 7059' glass substrate, a copper film and a nickel-copper multilayer deposited on this substrate by electron beam evaporation, using a neutron reflectivity measurement set-up, designed by us, on an existing spectrometer in DHRUVA reactor, Trombay, India. We have been able to characterize thicknesses of the layers with reasonable accuracy. Also we could detect a thin oxide layer on copper and interdiffusion at copper-nickel interfaces, with the present instrumental resolution.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| Keywords: | Neutron; Reflectivity; Thin Film; Multilayer |
| ID Code: | 17980 |
| Deposited On: | 17 Nov 2010 13:24 |
| Last Modified: | 04 Jun 2011 08:55 |
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