Banerjee, Ratnabali ; Ray, Swati ; Batabyal, A. K. ; Barua, A. K. ; Sen, Suchitra (1985) Structural characterization of tin doped indium oxide films prepared by magnetron sputtering Journal of Materials Science, 20 (8). pp. 2937-2944. ISSN 0022-2461
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Official URL: http://www.springerlink.com/index/X232K3034X315WX3...
Related URL: http://dx.doi.org/10.1007/BF00553058
Abstract
The structural characteristics of transparent and conducting thin films of tin doped indium oxide (ITO) have been studied by X-ray diffraction and electron microscopy. The ITO films have been prepared by radio frequency sputtering employing a planar magnetron configuration. The effects of variation of substrate temperature and annealing have been studied. Films deposited at substrate temperatures up to 230ο C show a marked (1 1 0) preferred orientation, whereas those deposited at 330ο C are preferentially oriented in the (3 1 1) direction. Transmission electron micrographs of ITO films deposited on KCI crystals show the possible effects of strain on the structure, which are minimized to a great extent by annealing.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Springer-Verlag. |
| ID Code: | 1627 |
| Deposited On: | 05 Oct 2010 12:10 |
| Last Modified: | 13 May 2011 10:00 |
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