Ray, Swati ; De, S. C. ; Barua, A. K. (1988) Characterization of microcrystalline silicon films prepared by the glow discharge method under different deposition conditions Thin Solid Films, 156 (2). pp. 277-286. ISSN 0040-6090
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...
Related URL: http://dx.doi.org/10.1016/0040-6090(88)90322-7
Abstract
Microcrystalline silicon thin films have been prepared by r.f. glow discharge decomposition of silane mixed with hydrogen under different deposition conditions. R.f. power, substrate temperature and the dilution of silane with hydrogen have been varied. Structural studies have been based on transmission electron microscopy, X-ray diffraction patterns and Roman spectra. The hydrogen content and its bonding configuration with silicon have been investigated from IR vibrational spectra. Dark conductivity and photoconductivity have been measured and correlated with the structural properties.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 1624 |
| Deposited On: | 05 Oct 2010 12:11 |
| Last Modified: | 13 May 2011 10:01 |
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