Photostimulated extended nitric oxide (no) release from water-soluble block copolymer to enhance antibacterial activity.

Paul, Soumya ; Ashrit, Priya ; Kumar, Manish ; Mete, Sourav ; Ghosh, Shilpendu ; Vemula, Praveen Kumar ; Mukherjee, Arindam ; De, Priyadarsi (2023) Photostimulated extended nitric oxide (no) release from water-soluble block copolymer to enhance antibacterial activity. Biomacromolecules, 25 (1). pp. 77-88. ISSN 1525-7797

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Official URL: https://doi.org/10.1021/acs.biomac.3c00822

Related URL: http://dx.doi.org/10.1021/acs.biomac.3c00822

Abstract

N-Nitrosamines are well established motifs to release nitric oxide (NO) under photoirradiation. Herein, a series of amphiphilic N-nitrosamine-based block copolymers (BCPx-NO) are developed to attain controlled NO release under photoirradiation (365 nm, 3.71 mW/cm2). The water-soluble BCPx-NO forms micellar architecture in aqueous medium and exhibits a sustained NO release of 92–160 μM within 11.5 h, which is 36.8–64.0% of the calculated value. To understand the NO release mechanism, a small molecular NO donor (NOD) resembling the NO releasing functional motif of BCPx-NO is synthesized, which displays a burst NO release in DMSO within 2.5 h. The radical nature of the released NO is confirmed by electron paramagnetic resonance (EPR) spectroscopy. The gradual NO release from micellar BCPx-NO enhances antibacterial activity over NOD and exhibits a superior bactericidal effect on Gram-positive Staphylococcus aureus. In relation to biomedical applications, this work offers a comprehensive insight into tuning light-triggered NO release to improve antibacterial activity.

Item Type:Article
Source:Copyright of this article belongs to American Chemical Society.
ID Code:137973
Deposited On:29 Aug 2025 08:42
Last Modified:29 Aug 2025 08:42

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