Direct measurements of island growth and step-edge barriers in colloidal epitaxy

Abstract

Colloids are often used as analogs for atoms in order to study crystallization kinetics or glassy dynamics using particles that are much easier to observe and that move on much slower time scales. Ganapathy et al. (p. 445; see the Perspective by Einstein and Stasevich) consider whether the analogous behavior extends to the growth of epitaxial films, a technique that is used in manufacturing. Controlling the rate of addition of the colloidal particles allowed the mapping of diffusional pathways during film nucleation and growth on a patterned substrate. The same relationships used to describe atomistic growth could be applied to the colloidal systems, but certain growth barriers such as those found at step edges and corners were controlled by diffusion rather than energetics.