Bhogra, Meha ; Waghmare, Umesh V. (2021) Flat Phonon Band-Based Mechanism of Amorphization of MOF-5 at Ultra-low Pressures Journal of Physical Chemistry C, 125 (27). pp. 14924-14931. ISSN 1932-7447
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Official URL: http://doi.org/10.1021/acs.jpcc.1c02598
Related URL: http://dx.doi.org/10.1021/acs.jpcc.1c02598
Abstract
MOF-5 is a crystalline metal–organic framework (MOF) with large pore volume and exceptional thermal stability. However, it undergoes irreversible amorphization at surprisingly low pressures of about 10 MPa. While such disruption of framework-topology was attributed to the rupture of− C–O–bonds of the carboxylate groups in its rigid secondary building units (SBUs), these energy-intensive bond-breaking events are unlikely to occur at minuscule pressures of a few MPa.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Chemical Society. |
ID Code: | 135802 |
Deposited On: | 18 Aug 2023 10:24 |
Last Modified: | 18 Aug 2023 10:24 |
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