Transmission Electron Microscopy and High-Resolution Transmission Electron Microscopy Study of Nanostructure and Metastable Phase Evolution in Pulsed-Laser-Ablation–Deposited Ti–Si Thin Film

Abstract

Thin films with a nominal composition close to Ti62.5Si37.5 were deposited on NaCl substrate at room temperature by pulsed laser ablation to study the evolution of the intermetallic compound Ti5Si3 using a combination of high-resolution and in situ transmission electron microscopy. The as-deposited amorphous films contain Ti-rich clusters, which influence the phase evolution and the decomposition behavior of the amorphous film. These clusters influence the nucleation of a metastable fcc Ti solid solution (ao = 0.433 nm) with composition richer in Ti than Ti62.5Si37.5 as the first phase to crystallize at 773 K. The Ti5Si3 nanocrystals form later, and even at 1073 K they coexist with fine fcc Ti-rich nanocrystals. Subsequent Ar+ ion-milling of the crystallized film results in a loss of silicon. The composition change leads to the dissolution of the Ti5Si3 nanocrystals and evolution of a new metastable Ti-rich fcc phase (ao= 0.408 nm).