Low- and high-energy plasma immersion ion implantation for modification of material surfaces

Mukherjee, S. ; Chakraborty, J. ; Gupta, S. ; Raole, P. M. ; John, P. I. ; Rao, K. R. M. ; Manna, I. (2002) Low- and high-energy plasma immersion ion implantation for modification of material surfaces Surface & Coatings Technology, 156 (1-3). pp. 103-109. ISSN 0257-8972

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S02578...

Related URL: http://dx.doi.org/10.1016/S0257-8972(02)00072-5

Abstract

Low- and high-energy plasma immersion ion implantation (PIII) of nitrogen has been performed on austenitic stainless steel and high-carbon low-alloy steel to modify their surface properties. In the case of austenitic stainless steel, an expanded austenite layer with surface microhardness of 650 HV was formed with a thickness of 7-8 μ m for an elevated treatment temperature of 400 °C, irrespective of the treatment energy. X-Ray photoelectron spectroscopy (XPS) investigations revealed that, at high energy, nitrogen is in a bound state and chromium nitride is formed in the subsurface region, followed by expanded austenite. In the case of high-carbon low alloy steel, the diffusion coefficient of nitrogen obtained by PIII is higher than that obtained by glow-discharge plasma nitriding. The results indicate that if implantation is followed by diffusion, low-energy PIII gives similar or better results than high-energy PIII as far as the treated layer thickness, phase formation and microhardness are considered. Low-energy PIII has a lower hardware cost and reduced sheath dimensions, and thus uniformity in surface modification is achieved.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:Plasma Immersion Ion Implantation (PIII); Expanded Austenite; Plasma Nitriding; Sheath
ID Code:13162
Deposited On:11 Nov 2010 06:42
Last Modified:16 Jul 2012 15:45

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