Basumatary, Himalay ; Arout Chelvane, J. ; Sridhara Rao, D.V. ; Kamat, S.V. ; Ranjan, Rajeev (2015) Effect of sputtering parameters on the structure, microstructure and magnetic properties of Tb-Fe films Thin Solid Films, 583 . pp. 1-6. ISSN 0040-6090
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Official URL: http://doi.org/10.1016/j.tsf.2015.03.026
Related URL: http://dx.doi.org/10.1016/j.tsf.2015.03.026
Abstract
The effect of sputtering parameters such as gas pressure and power on the structure, microstructure and magnetic properties of sputtered Tb-Fe thin films was investigated. X-ray diffraction and transmission electron microscopy studies showed that all the films were amorphous in nature irrespective of the sputtering parameters. A fine island kind of morphology was observed at low sputtering power whereas large clusters were seen at higher sputtering power. While the composition of Tb-Fe films remained constant with increasing sputtering power, the magnetic behaviour was found to change from superparamagnetic to ferromagnetic. On the other hand, the increase in argon gas pressure was found to deplete the iron concentration in Tb-Fe thin films, which in turn reduced the anisotropy and Curie temperature. Annealing of the films at 773 K did not result in any crystallization and the magnetic properties were also found to remain unchanged.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 122983 |
| Deposited On: | 01 Sep 2021 07:59 |
| Last Modified: | 01 Sep 2021 07:59 |
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