The resistive-heating characterization of laser heating system and LaB6 characterization of X-ray diffraction of beamline 12.2.2 at advanced light source

Yan, Jinyuan ; Knight, Jason ; Kunz, Martin ; Raju, Selva Vennila ; Chen, Bin ; Gleason, Arianna E. ; Godwal, Budhiram K. ; Geballe, Zack ; Jeanloz, Raymond ; Clark, Simon M. (2010) The resistive-heating characterization of laser heating system and LaB6 characterization of X-ray diffraction of beamline 12.2.2 at advanced light source Journal of Physics and Chemistry of Solids, 71 (8). pp. 1179-1182. ISSN 0022-3697

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S00223...

Related URL: http://dx.doi.org/10.1016/j.jpcs.2010.03.030

Abstract

X-ray diffraction from LaB6 standards document a precision of 478 ppm in lattice-parameter determinations for beamline 12.2.2 at Lawrence Berkeley National Laboratory's Advanced Light Source, a facility for characterizing materials at high pressures and temperatures using laser- and resistance-heated diamond cells. Melting of Ni, Mo, Pt and W, resistively heated at 1 atm pressure in Ar, provides a validation of the beamline spectroradiometric system that is used to determine sample temperatures. The known melting temperatures, which range from 1665 to 3860 K for these metals, are all reproduced to within ± 80 K.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:11793
Deposited On:13 Nov 2010 13:53
Last Modified:02 Jun 2011 08:36

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