Basu, Joysurya ; Carter, C. Barry ; Divakar, R. ; Shenoy, Vijay B. ; Ravishankar, N. (2008) Modified electron-beam-induced deposition of metal nanostructure arrays using a parallel electron beam Applied Physics Letters, 93 (13). Article ID 133104. ISSN 0003-6951
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Official URL: http://aip.scitation.org/doi/abs/10.1063/1.2992193...
Related URL: http://dx.doi.org/10.1063/1.2992193
Abstract
A modified electron-beam-induced deposition method using a parallel beam of electrons is developed. The method relies on the buildup of surface potential on an insulating surface exposed to an electron beam. Presence of sharp edges on the insulating surface implies presence of large electric fields that lead to site-specific nucleation of metal vapor on those regions. Feature sizes as small as 20nm can be deposited without the need to use fine probes, and thus the limitation of probe size imposed on the resolution is overcome. The use of pure metal vapor also renders the process inherently clean.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to American Institute of Physics. |
| ID Code: | 104989 |
| Deposited On: | 01 Feb 2018 16:31 |
| Last Modified: | 01 Feb 2018 16:31 |
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