Radha, Boya ; Kulkarni, Giridhar U. (2010) Patterned synthesis of Pd4S: chemically robust electrodes and conducting Etch masks Advanced Functional Materials, 20 (6). pp. 879-884. ISSN 1616-301X
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Official URL: http://onlinelibrary.wiley.com/doi/10.1002/adfm.20...
Related URL: http://dx.doi.org/10.1002/adfm.200901766
Abstract
A simple, one-step process to synthesize Pd4S films is reported here along with their characterization using X-ray diffraction, electron microscopy, and electrical measurements. The synthesis involves thermolysis of a single-source precursor, namely palladium alkanethiolate, in H2 atmosphere at 250 °C for 3 h. The films are highly conducting and resistant to strong acidic, alkali, and oxidizing environments. The precursor allows patterning of the Pd4S films by electron beam lithography and micromolding, an attribute that has been employed in making chemically resistant electrodes and etch masks. The conversion of palladium thiolate to other sulfide phases is also achieved.
Item Type: | Article |
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Source: | Copyright of this article belongs to John Wiley and Sons, Inc. |
ID Code: | 102999 |
Deposited On: | 04 Mar 2017 12:40 |
Last Modified: | 04 Mar 2017 12:40 |
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