Kulkarni, G. U. ; Radha, B. (2010) Metal nanowire grating patterns Nanoscale, 2 (10). pp. 2035-2044. ISSN 2040-3364
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Official URL: http://pubs.rsc.org/en/Content/ArticleLanding/2010...
Related URL: http://dx.doi.org/10.1039/C0NR00088D
Abstract
Metal nanowire patterning in the form of grating structures has been carried out using a wide range of lithography techniques, and many hybrid methods derived from them. The challenge is to achieve sub-100 nm linewidths with controllable spacing and thickness over large areas of substrates with high throughput. In particular, the patterns with linewidth and spacing of a few tens of nm offer properties of great interest in optoelectronics and plasmonics. Crossbar grating structures—two gratings patterned perpendicular to each other—will play an important role as ultra-high density electrode grids in memristive devices for non-volatile memory.
Item Type: | Article |
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Source: | Copyright of this article belongs to Royal Society of Chemistry. |
ID Code: | 102994 |
Deposited On: | 06 Mar 2017 12:42 |
Last Modified: | 06 Mar 2017 12:42 |
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