A comparison of nucleation and growth investigations of thin films using scanning tunneling microscopy, atomic force microscopy and X-ray scattering

Dharmadhikari, C. V. ; Ali, A. O. ; Suresh, N. ; Phase, D. M. ; Chaudhari, S. M. ; Gupta, A. ; Dasannacharya, B. A. (2000) A comparison of nucleation and growth investigations of thin films using scanning tunneling microscopy, atomic force microscopy and X-ray scattering Materials Science and Engineering: B - Solid-State Materials for Advanced Technology, 75 (1). pp. 29-37. ISSN 0921-5107

Full text not available from this repository.

Official URL: http://linkinghub.elsevier.com/retrieve/pii/S09215...

Related URL: http://dx.doi.org/10.1016/S0921-5107(00)00385-8

Abstract

Roughness and general morphology of silver films grown on Si(111) substrates have been investigated using scanning tunneling microscopy (STM) and atomic force microscopy (AFM) and X-ray scattering. The results are quantitatively analyzed in terms of height histograms, height-height correlations in the light of dynamical scaling approach. The scaling exponents obtained by the three techniques used here are in agreement with each other. Some quantitative differences in rms roughness can be explained by considering wavelength spectrum of roughness probed by these techniques.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:Growth; Scanning Tunneling Microscopy; Atomic Force Microscopy; X-ray Diffraction
ID Code:10172
Deposited On:03 Nov 2010 04:17
Last Modified:28 May 2011 05:35

Repository Staff Only: item control page