Lithography for imprinting colored patterns with quantum dots

Abstract

In this article, we report a new form of lithography that involves a reaction between a gas and an ion embedded in a polymer film. The principle is based on a combination of top-down and bottom-up approaches in which a transmission electron microscope grid is placed on a poly(vinylpyrrolidone) film containing Cd²⁺ ions, which is then exposed to H₂S gas. This leads to the generation of a fluorescent yellow pattern due to the formation of CdS nanoparticles on exposed parts of the film. Also, we have used the same method to generate patterns in two colors by starting with a green fluorescent dye incorporated into the film and following the same procedure in which patterned yellow-orange CdS nanoaparticles are distributed over the background fluorescence of the dye. We have used fluorescence microscopy, UV−vis and fluorescence spectroscopy, transmission electron microscopy, atomic force microscopy, and X-ray diffraction methods for the characterization of the products and patterns. This method could possibly be a fairly general method of generating patterned materials on 2D and 3D substrates.