An X-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution

Dev, B. N. ; Aristov, V. ; Hertel, N. ; Thundat, T. ; Gibson, W. M. (1985) An X-ray standing wave interference spectrometric (XSWIS) analysis of bromine adsorbed on cleaved silicon from solution Journal of Vacuum Science & Technology A, 3 (3). p. 975. ISSN 0734-2101

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Official URL: http://avspublications.org/jvsta/resource/1/jvtad6...

Related URL: http://dx.doi.org/10.1116/1.573366

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Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
ID Code:10129
Deposited On:02 Nov 2010 10:43
Last Modified:30 May 2011 06:10

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