Shape variation in epitaxial microstructures of gold silicide grown on br-passivated Si(1 1 1) surfaces

Chakraborty, S. ; Kamila, J. ; Rout, B. ; Satpati, B. ; Satyam, P. V. ; Sundaravel, B. ; Dev, B. N. (2004) Shape variation in epitaxial microstructures of gold silicide grown on br-passivated Si(1 1 1) surfaces Surface Science, 549 (2). pp. 149-156. ISSN 0039-6028

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/S00396...

Related URL: http://dx.doi.org/10.1016/j.susc.2003.11.034

Abstract

Kinetic Monte Carlo simulations for growth on substrates of three-fold symmetry predict the growth of islands of various shapes depending on the growth temperature [Phys. Rev. Lett. 71 (1993) 2967]. On Br-Si(1 1 1) substrates growth of epitaxial gold silicide islands of equilateral triangular and trapezoidal shapes have earlier been observed by annealing at the Au-Si eutectic temperature, 363 °C [Phys. Rev. B 51 (1995) 14330]. We carried out annealing with temperature variation within a small window--(363 ± 30) °C. This has led to island growth of additional shapes like regular hexagon, elongated hexagon, walled hexagon and dendrite. Some of the observed island shapes have not been predicted.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:Epitaxy; Growth; Halogens; Silicon; Atomic Force Microscopy; Faceting
ID Code:10128
Deposited On:02 Nov 2010 10:43
Last Modified:16 May 2016 19:48

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