Chen, Zheliu ; Ajayagohosh, A. ; Yamaoka, Tsuguo ; Sukigara, Mitsunori (1995) Thermal and acid-catalyzed reaction of bifunctional vinyl ether urethane in nonionic and ionic polymer matrices Polymers for Advanced Technologies, 6 (12). pp. 733-739. ISSN 1042-7147
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Official URL: http://onlinelibrary.wiley.com/doi/10.1002/pat.199...
Related URL: http://dx.doi.org/10.1002/pat.1995.220061203
Abstract
A bifunctional vinyl ether urethane derivative (BVU) was synthesized and characterzed. Photoresist systems consisting of BVU and a photoacid generator (PAG) along with various matrix polymers were prepared and the photoresist characteristics were evaluated. In the presence of BVU and a PAG, poly(methylmethacrylate-co-acrylic acid) and poly(methylmethacrylate) exhibited positive and negative tone behavior, respectively, where as poly(p-hydroxystyrene) showed both positive and negative working properties depending on the prebake temperature of the system. The depandence of the photoresist behaviors on these matrix polymers was studied. The mechanism of the thermal and photochemical reactions was revealed.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to John Wiley and Sons. |
| Keywords: | Vinyl Ether Urethane; Photoacid Generator; Negative-Tone; Positive-Tone; Microelectronic Applications; Urethane Monomer |
| ID Code: | 96151 |
| Deposited On: | 05 Dec 2012 11:55 |
| Last Modified: | 05 Dec 2012 11:55 |
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