Srivastava, S. K. ; Krishnakumar, E. ; Souza, A.C. de A. e (1991) Cross-sections for the formation of negative ions by electron impact on silane International Journal of Mass Spectrometry and Ion Processes, 107 (1). pp. 83-89. ISSN 0168-1176
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0168-1176(91)85074-V
Abstract
Cross-sections and appearance potentials for the production of various negative ion species by electron impact on SiH4 have been measured. They are compared with two previous measurements which widely differ with each other. Hess' law has been applied to predict the various possible channels of dissociation.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 95387 |
| Deposited On: | 06 Nov 2012 11:41 |
| Last Modified: | 06 Nov 2012 11:41 |
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